1: \begin{abstract}

2: Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. 

3: In a detailed convergence study it is shown that accurate results can be attained for relatively large 

4: 3D computational domains and  in the presence of sidewall-angles and corner-roundings. 

5: \end{abstract}

6: