1: \begin{abstract}

2: Photolithography is a process in the production of integrated circuits

3: in which a mask is used to create an exposed pattern with a desired

4: geometric shape. In the inverse problem of photolithography, a desired

5: pattern is given and the mask that produces an exposed pattern which

6: is close to the desired one is sought.  We propose a variational

7: approach formulation of this shape design problem and introduce a

8: regularization strategy. The main novelty in this work is the

9: regularization term that makes the thresholding operation involved

10: in photolithography stable.  The

11: potential of the method is demonstrated in numerical experiments.

12: 

13: 

14: \noindent \textbf{Keywords} photolithograpy, shape optimization,

15: inverse problem, calculus of variations, sets of finite perimeter,

16: $\Gamma$-convergence.

17: \end{abstract}

18: