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4: \begin{document}
5:
6: \shorttitle{OSIRIS Mask Designer}
7:
8: \shortauthors{Gonz\'alez-Serrano et al.}
9:
10:
11:
12: \title {\bf OSIRIS software: the Mask Designer Tool}
13:
14: \author{J.I. Gonz\'alez-Serrano}
15: \affil{Instituto de F\'\i sica de Cantabria (CSIC-Universidad de
16: Cantabria)} \affil{Avda. de los Castros s/n, 39005 Santander,
17: Spain} \email{gserrano@ifca.unican.es}
18: \author{M. S\'anchez-Portal}
19: \affil{Universidad Pontif\'\i cia de Salamanca en Madrid, 28040
20: Madrid, Spain}
21: \author{H. Casta\~neda}
22: \affil{Instituto de Astrof\'\i sica de Canarias, 38200 La Laguna,
23: Tenerife, Spain }
24: \author{R. Quirk, E.D. de Miguel}
25: \affil{GMV S.A., 28760 Tres Cantos, Madrid, Spain} \and
26: \author{M. Aguiar, J. Cepa}
27: \affil{Instituto de Astrof\'\i sica de Canarias, 38200 La Laguna,
28: Tenerife, Spain}
29:
30:
31:
32:
33: \begin{abstract}
34:
35: OSIRIS is a Day One instrument that will be available at the 10m
36: GTC telescope which is being built at La Palma observatory in the
37: Canary Islands. This optical instrument is designed to obtain
38: wide-field narrow-band images using tunable filters and to do
39: low-resolution spectroscopy in both long-slit and multislit modes.
40: For the multislit spectroscopy mode, we have developed a software
41: to assist the observers to design focal plane masks. In this paper
42: we describe the characteristics of this Mask Designer tool. We
43: discuss the main design concepts, the functionality and particular
44: features of the software.
45:
46:
47: \end{abstract}
48:
49:
50:
51:
52: \section{INTRODUCTION}
53:
54: OSIRIS (Optical System for Imaging and low/intermediate-Resolution
55: Integrated Spectroscopy) is an instrument designed to obtain images
56: and low-resolution spectra in the optical domain (from 3650 through
57: 10,000 \AA). It will be installed at the Nasmyth focus of the 10m
58: GTC telescope \citep{alva04} at La Palma observatory, although it
59: can be also mounted at the Cassegrain focus. A detailed account of
60: the observing modes, optical design, and performance is given in
61: \citet{cepa03}.
62:
63: OSIRIS is a versatile instrument offering many observing modes: (a)
64: direct imaging with broad-band and narrow-band using tunable
65: filters, (b) narrow-band with charge shuffling, (c) fast photometry,
66: (d) long-slit spectroscopy, (e) multi-object spectroscopy, (f)
67: nod-and-shuffle multi-object spectroscopy, and (g) fast
68: spectroscopy. The main driver of the optical and mechanical design
69: of OSIRIS has been the inclusion of tunable filters (TF) in order to
70: obtain narrow-band imaging at an arbitrary wavelength with effective
71: resolutions of around 5-60 \AA. In the spectroscopic modes, OSIRIS
72: provides spectral resolutions $R=\lambda/\Delta\lambda$ of 250, 500,
73: 1500, and 2500 covering the full spectral range from 3650 to 10,000
74: \AA\ by using 11 grisms. Grisms can be rotated by $90^\circ$ to
75: change the dispersion direction and allow for fast spectroscopic
76: observations. The detector consists of a mosaic of two 2k$\times$4k
77: Marconi MAT-44-82 CCDs of 15$\mu$m/pixel providing a large field of
78: view ($\sim 8\farcm5\times8\farcm5$) and a pixel size of
79: $0\farcs125$. There will be a gap of 8.3 arcsec parallel to the
80: normal dispersion direction.
81:
82:
83: OSIRIS will be the first instrument using the technique of tunable
84: filters in large telescopes. The potential of this observational
85: mode has been described widely in the literature (e.g.
86: \citet{jones01}; \citet{jones02}; \citet{bland03};
87: \citet{glaz04}).
88:
89: The next observational mode in complexity is the multi-object
90: spectroscopy (MOS). This technique arrived at its maturity in the
91: eighties, increasing significantly the number of objects that can be
92: observed simultaneously. Together with advances in optical design,
93: new coatings for the camera elements, large-format detectors, and
94: new technologies in grisms and diffraction gratings, their use in
95: large telescopes is opening new windows in astronomical research,
96: especially in the developments of large scale surveys. Recently, the
97: use of the technique of nod-and-shuffle allows to obtain spectra
98: with optimal sky subtraction, making possible to observe deeper
99: \citep{glaz01}.
100:
101:
102: Most of the observing modes need to block part of the FOV to allow
103: either charge shuffling or slit and multislit spectroscopy. This
104: blocking is done by using a mask located at the telescope focal
105: plane. Masks are fabricated by cutting the necessary holes or
106: slits in aluminium plates which are of $496\times 480$ mm in size,
107: being the size of the imaging field of $422\times 428$ mm. In
108: standard MOS mode, the number of slits (8 arcsec long) that can
109: fit in a single mask is around 60 and 100 at the highest and
110: lowest spectral resolution, respectively.
111:
112: In this paper we describe the software that has been
113: developed to assist the observer to design OSIRIS masks.
114:
115:
116: \section{OVERVIEW OF THE OSIRIS MASK SYSTEM}
117:
118: The OSIRIS Mask System is the system in charge of storing and
119: positioning masks and it is fully described in \citet{mili03}.
120: Figure 1 shows a general view of the Mask System. A cassette
121: provides storage for 13 masks which are positioned at the focal
122: plane by a Mask Loader Mechanism. The position accuracy of the
123: masks over the telescope focal plane is of the order of 0.01 mm.
124:
125: Masks are slightly curved in cylindrical form in order to adapt to
126: the geometry of the focal plane. Masks will be tooled in a flat
127: plate and afterwards bent to fit the cylindrical shape over the
128: mask frame.
129:
130:
131:
132: \section{OVERVIEW OF THE MASK DESIGNER}
133:
134: For each 10m-class telescope where an instrument with MOS
135: capabilities is operating, a specific software for mask design has
136: been developed. Examples are the FORS Instrument Mask Simulator
137: \citep{humm00}, the VIMOS Mask Preparation Software
138: \citep{botti01}, and the Mask Design Program of FOCAS
139: \citep{saito03}. Our software has been designed to provide similar
140: capabilities to these programs, adapted to the special needs of
141: OSIRIS.
142:
143: The Mask Designer is a subsystem of the OSIRIS Observing Program
144: Manager which is, in turn, integrated into the GTC Control System
145: \citep{filg98}. The software has been designed using Unified
146: Modelling Language (UML) and coded in Java programming language.
147:
148: The OSIRIS Mask Designer is a plug-in application of the
149: JSkyCat\footnote{\tt http://archive.eso.org/JSky} package. In this
150: way, the software uses classes from JSkyCat to manage FITS files,
151: to perform coordinate transformations, and for graphical user
152: interface.
153:
154: The Mask Designer performs all the
155: calculations needed to transform sky (RA and DEC) and CCD ($x,y$)
156: coordinates to coordinates over the mask. The final output of the
157: Mask Designer is therefore a set of instructions for the machine in
158: charge of cutting the holes in the mask plate. This means that
159: accurate coordinate transformations are needed to convert from sky
160: to telescope focal plane positions, and from CCD to focal plane
161: positions. Also, atmospheric refraction and thermal expansion
162: corrections should be taken into account. Figure 2 shows all the
163: coordinate transformations needed to correct a sky position onto a
164: CCD position which include: (1) atmospheric refraction, (2) gnomonic
165: projection and geometrical distortion of the telescope focal plane,
166: (3) transformation from telescope focal plane onto mask surface, (4)
167: mapping from mask to CCD plane. Atmospheric refraction is computed
168: following \citet{fili82} and depends on wavelength, air pressure and
169: temperature, as well as on zenith distance of the targets.
170: Transformations between different surfaces are made using 5th-order
171: polynomials whose coefficients will be obtained in the instrument
172: commissioning phase. Taking into account the errors due to mask
173: fabrication, mechanical flexures, thermal expansion, astrometric
174: accuracy, and the fact that the mask shape does not match exactly
175: the focal plane, we expect that the position of the slits over the
176: targets (after acquiring the field using fiducial stars), will be
177: better than a 6\% of the slit width. For a nominal slit of 1.4
178: arcsec, this corresponds to a positional accuracy of 0.08 arcsec.
179:
180: Two types of masks can be generated depending of the OSIRIS
181: observing mode. In the standard MOS mode, slits can be located at
182: any position over the physical area of the mask. The second
183: observing mode is nod and shuffle which allows astronomers to
184: subtract the sky emission by nodding the telescope between targets
185: and sky while simultaneously CCD charge is shuffled up and down
186: (e.g. \citet{glaz01}). In this mode slits can be smaller than in
187: standard MOS mode.
188:
189: The system performs the necessary checks for mask integrity, slit
190: collision and spectra overlapping. In case of overlapping slits or
191: spectra the software can assign slits to additional masks using a
192: priority-based algorithm. The software also takes into account the
193: gap in the detector plane and the edges of the mask plate which
194: are disabled by the mask frame that holds the mask plate.
195:
196:
197:
198:
199:
200: \section{DECOMPOSITION DIAGRAM}
201:
202: Figure 3 is a diagram showing the high-level classes in which the
203: Mask Designer system has been decomposed. These classes
204: (UserInputHandler, FileHander, and MaskHandler) are in turn
205: decomposed into individual classes.
206: The class OSIRIS\_Mask\_Designer represents the
207: whole system and contains all the functionality to fully produce
208: masks. Composite class UserInputHandler holds the functionality
209: for handling the user interaction with the system. FileHander
210: class is in charge of all actions regarding files. The MaskHandler
211: composite class contains the algorithms for processing the slit
212: data, transforming coordinates, and producing valid mask
213: configurations. Its decomposition diagram is shown in Fig. 3.
214:
215: Algorithms for processing the slits and producing valid mask
216: configurations belong to classes SlitProcessor and MaskProcessor.
217: Classes SkyToMaskMapping and CCD\_ToMaskMapping contain the
218: functions needed to transform coordinates between the different
219: systems involved.
220:
221: Not all the operations are shown in this diagram as all classes
222: are decomposed into many simpler functions.
223:
224: The Mask Designer has been designed as a plug-in of JSkyCat
225: application, which contains many other classes and packages
226: required by the system. The most relevant JSky utilities and
227: classes used by the OSIRIS Mask Designer are: WCSTransform to
228: convert between image pixel and WCS (World Coordinate System)
229: coordinates; FITSCodec for handling of FITS files; GUI classes for
230: image display and related tasks.
231:
232:
233: \section{FEATURES OF THE MASK DESIGNER}
234:
235: The OSIRIS Mask Designer is launched by starting the JSkyCat
236: application and therefore, its functionality initially is
237: identical to that of JSkyCat. All operations are invoked through
238: the main JSkyCat menu bar (see Fig. 4).
239:
240: \subsection{Configuration file}
241:
242: For the different parameters related to a particular observation,
243: such as date, hour angle, central coordinates of the field, grism,
244: position of the grism (0 or 90 degrees for normal or fast modes,
245: respectively), position angle of the mask onto the sky, expected
246: observation temperature and pressure, expected fabrication
247: temperature, maximum number of masks per pointing, the system
248: implements a Configure Observation menu to read an XML file
249: (Observation Configuration File). Other XML configuration files
250: are needed by the system but they are not user configurable. These
251: contain telescope and instrument parameters and information
252: relevant to computations, such as the coefficients for coordinate
253: transformations and grism properties. The main advantage of using
254: XML files is that full independence from target platform is
255: guaranteed.
256:
257:
258: \subsection{Input options}
259:
260: The software can process slits defined interactively by using an
261: image displayed on the screen, via cursor. This image should
262: either have absolute astrometry information on its header or it
263: can be a raw frame taken with OSIRIS in broad-band mode.
264: Alternatively, the user can provide a list of coordinates and slit
265: properties (type, width, priority) that can be, in turn, either
266: absolute equatorial coordinates or pixel coordinates from a raw
267: broad-band image taken with OSIRIS. These options allow processing
268: object lists obtained with, for instance, image detection
269: software.
270:
271: The mask designer can be run in four different modes:
272:
273: \begin{itemize}
274:
275:
276: \item Defining slit positions interactively using a raw image
277: taken with OSIRIS
278:
279: \item Defining slit positions interactively using an image
280: containing absolute astrometric information in its header
281:
282: \item Using a list of RA and DEC coordinates
283:
284: \item Using a list of $x$, $y$ positions from a raw image
285: taken with OSIRIS
286:
287: \end{itemize}
288:
289:
290: \subsection{Slits}
291:
292: Three different types of slits can be defined: (a) rectangular,
293: (b) circular, and (c) curved slits. Circular slits are used mainly
294: (but not exclusively) to define fiducial holes. A minimum of three
295: fiducial slits must be defined, normally to include bright stars
296: in the field, in order to acquire the field. The type of the slit
297: is defined by launching the Slit Window (see Fig. 5) and can be
298: changed at any moment during the process of defining the slits.
299: Also, the slit dimensions can be changed by selecting a slit
300: already defined. Slits can be deleted either one by one or all at
301: once.
302:
303: A special feature of this software is the ability of defining
304: curved slits (available only in interactive processing). These are
305: arc-shaped slits and may be useful for taking spectra of special
306: targets such as, for instance, galaxy arcs produced by
307: gravitational lensing.
308:
309: \subsection{Overlapping and integrity check}
310:
311: Integrity checks are made to avoid placing slits too close to mask
312: borders or to other slits which may cause the mask to break at the
313: fabrication process. Once all the slits are successfully
314: configured the system processes the information. Several masks can
315: be generated up to a maximum value specified by the user. The
316: system will try to place as many slits as possible in the first
317: mask. Slits are placed in additional masks depending on their
318: priority, which is set by the user. Overlapping slits or slits
319: producing integrity conflicts are placed onto the second mask and
320: so forth until the maximum number of masks is reached. A residual
321: mask is produced containing conflicting or out-of-bounds slits.
322: This mask will not be sent to fabrication, being its only purpose
323: to inform the user.
324:
325: Conflicting and out-of-bounds slits are highlighted on the display
326: using a color code to help the user to re-design the mask.
327:
328:
329: \subsection{Output}
330:
331: The output consists of several files containing all the
332: information required to build the masks. The user can save the
333: work after masks have been processed. Saved files can be retrieved
334: for later processing if needed. There are three output files, two
335: of them in FITS format and the third in a format that will be read
336: by the cutting machine software. A FITS file called ODF (Object
337: Definition File) includes all the slits defined by the user,
338: including invalid ones. The file contains the observation and
339: telescope data, and, for all the generated masks, slit type and
340: slit positions. A separate storage is provided in the ODF file to
341: keep the fiducial slit information. This file can be handled by
342: the Mask Designer to allow the user to modify the design in new
343: sessions.
344:
345: A second FITS file, called MDF (Mask Definition File),
346: is generated for each mask. There is one file per mask containing
347: only the slit information corresponding to that mask. A MDF can be
348: saved also for the Residual Mask, although in that case, fiducial
349: slits information is lost.
350: The third file is the so-called Mask Cutter File and contains
351: instructions to be read by the cutting machine to fabricate
352: physically the masks.
353:
354:
355: The user has the option of printing a graphic view of each mask,
356: containing the defined slits, the fiducial holes and, if wanted,
357: rectangles marking where the spectra will appear in the image. An
358: example is shown in Figure 6.
359:
360:
361: \section{CONCLUSIONS}
362:
363: We have designed and developed an application to design focal
364: plane multislit masks for the instrument OSIRIS. Its functionality
365: has been tested and the user requirements have been achieved.
366: The software takes into account all the effects
367: that could affect an accurate slit positioning over the mask
368: plates, and allows different input scenarios to design OSIRIS
369: masks. It has been designed as a JSky plug-in offering an easy
370: user interface.
371:
372: Only during the instrument commissioning phase will be
373: possible to test the software in real conditions. A critical issue
374: is the fine tuning of the parameters involved in coordinate
375: transformations. In particular, the coefficients to convert from
376: telescope focal plane to detector and from sky to telescope focal
377: plane will be obtained using pin-hole masks and observations of
378: astrometric fields. Commisioning phase for OSIRIS at the GTC is
379: planned to start in 2006.
380:
381: \acknowledgments Figure 1 has been kindly provided by Lorenzo
382: Peraza. This work has been supported by the Spanish Plan Nacional
383: de Astronom\'\i a y Astrof\'\i sica under grants AYA2000-2688-E,
384: AYA2002-03326, and AYA2002-01379.
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435:
436: \figcaption[]{General view of the OSIRIS Mask System showing the
437: focal plane bench, the mask frame, and the mask cassette with
438: capacity for 13 masks}
439:
440: \figcaption[]{Schematic view of the coordinate transformations
441: involved in the design of a slit mask}
442:
443: \figcaption[]{OSIRIS Mask Designer decomposition diagram showing, at the highest level, the classes in which
444: the Mask Designer is decomposed. A further class decomposition is shown here for class MaskHandler, which is in charge
445: of the most important functions of the application}
446:
447: \figcaption[]{Mask Designer Menu selection in JSkyCat}
448:
449: \figcaption[]{Slit Window used to define and change slit
450: properties}
451:
452: \figcaption[]{Example of output showing the slits and the
453: predicted spectra over the detector area of OSIRIS. There are 68
454: slits including four fiducial circular holes and a curved slit.
455: The horizontal band at the middle of the plot represents the gap
456: between the two CCD detectors}
457:
458:
459: \newpage
460:
461: Keywords: telescopes -- instrumentation: spectrographs
462:
463: \newpage
464:
465:
466: \end{document}
467: