1: \begin{abstract}

2: We consider the inverse problem of determining an optical mask that

3: produces a desired circuit pattern in photolithography. We

4: set the problem as a shape design problem in which the unknown

5: is a two-dimensional domain.  The relationship between the target

6: shape and the unknown is modeled through diffractive optics.  We

7: develop a variational formulation that is well-posed and

8: propose an approximation that can be shown to have convergence

9: properties.  The approximate problem can serve as a

10: foundation to numerical methods.

11: 

12: 

13: \medskip

14: 

15: \noindent\textbf{AMS 2000 Mathematics Subject Classification}

16: Primary 49Q10. Secondary 49J45, 49N45. %something in 78-XX??

17: 

18: \medskip

19: 

20: \noindent \textbf{Keywords} photolithograpy, shape optimization, sets of finite perimeter, $\Gamma$-con\-ver\-gen\-ce.

21: \end{abstract}

22: