1: \begin{abstract}

2: 

3: We have developed an interface which allows to perform rigorous electromagnetic field (EMF)

4: simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations

5: with the simulator Dr.LiTHO.

6: With the combined tools we investigate the convergence of near-field and far-field results

7: for different DUV masks.

8: We also benchmark results obtained with the waveguide-method EMF

9: solver included in Dr.LiTHO and with the finite-element-method

10: EMF solver JCMsuite.

11: We demonstrate results on convergence for dense and isolated hole arrays, for masks including

12: diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.

13: 

14: 

15: \end{abstract}

16: