1: \begin{abstract}

2: 

3: Rigorous computer simulations 

4: of propagating electromagnetic fields 

5: have become an important tool for optical metrology 

6: and optics design of nanostructured components. 

7: As has been shown in previous benchmarks some of the 

8: presently used methods suffer from low convergence 

9: rates and/or low accuracy of the results and exhibit

10: very long computation times~\cite{Burger2005bacus,Burger2006c}

11: which makes application to extended 2D layout patterns impractical.

12: We address 3D simulation tasks by using a finite-element 

13: solver which has been shown to be superior to competing 

14: methods by several orders of magnitude in accuracy and 

15: computational time for typical microlithography 

16: simulations~\cite{Burger2006c}. 

17: We report on the current status of 

18: the solver, incorporating higher order edge elements, 

19: adaptive refinement methods, and fast solution algorithms.

20: Further, we investigate the performance of the solver in the 

21: 3D simulation project of light diffraction off an alternating phase-shift 

22: contact-hole mask.

23: \end{abstract}

24: