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27: \begin{titlepage}

28: 

29: \begin{center}

30: { \LARGE \textbf {Discovery of a Planar Waveguide for an X-Ray Radiation}}

31: 

32: \bigskip

33: 

34: V.K.~Egorov\footnote{E-mail: egorov@ipmt-hpm.ac.ru},

35: $^*$E.V.~Egorov

36: 

37: IPMT RAS, Chernogolovka, Moscow Dist, Russia

38: 

39: $^*$MEPhI, Moscow, Russia

40: \end{center}

41: 

42: \renewcommand{\abstractname}{}

43: 

44: \begin{abstract}

45: 

46: A simple model of X-Ray standing waves (XSW) formation in the slit

47: of a planar waveguide of X-Ray radiation beam  for the angle area

48: restricted by the critical total reflection angle is developed. It is shown that the model is true for a case of the Bragg reflection.

49: The conditions required for XSW to appear in the space between two

50: polished parallel plane plates are formulated and a slit size

51: interval conforming to these conditions is evaluated. A mechanism

52: of a XSW intensity decrease in a planar waveguide is proposed.

53: This mechanism explains a high efficiency of slitless collimator

54: application for the transportation of narrow X-Ray beams.

55: 

56: Some recommendations on the application of the planar X-Ray waveguide in

57: X-Ray structural and spectral studies of surface are presented.

58: 

59: \end{abstract}

60: 

61: \noindent \textbf {Key words:} total reflection, X-Ray standing

62: wave (XSW), planar X-Ray waveguide, planar X-Ray

63: waveguide-monochromator

64: 

65: \end{titlepage}

66: 

67: \section{Introduction}

68: 

69: A slit former of X-Ray beams with extensive plane restraints has long been

70: used as one of the basic components in X-Ray optics. A well-known example is

71: the Soller slit that contains a set of closely spaced thin parallel metallic

72: plates ensuring an X-Ray beam with a required divergence \cite{X-RAY1,PHYS1E}. Another example of

73: the unit is an aligned diffractometric slit 50~mm long with a clearance size

74: between the parallel quartz plates of 0.1~mm \cite{X-RAY1,RD63}.

75: 

76: These slits are sometimes used to form an X-Ray excitation beam in TXRF

77: spectrometry \cite{NIM1,ZAV1E}. For example, an X-Ray collimator formed by two quartz

78: parallel plates with a 0.1~mm clearance served as a double X-Ray beam

79: reflector to form an excitation beam for total X-Ray reflection fluorescence

80: analysis \cite{NIM1}.

81: 

82: In X-Ray diffraction practices the plane slit monochromators used for

83: the X-Ray line narrowing in an excitated beam has a wide application

84: \cite{APL1E,FIZTT1E}.

85: This devices designates as Bonse-Hart monochromators are distinguished

86: by multiple reflections within a groove cut into a large

87: single crystal or within a slit formed by two oriented monocrystal plates.

88: 

89: Lately, in addition to X-Ray planar extensive collimators characterized by

90: the visible size of a clearance between solid reflectors formed it, so

91: called slitless X-Ray collimators has come into use for X-Ray fluorescence

92: analysis \cite{IET2E,ELPROM1E,IZV1E,ADV1,POV1E}. The slitless collimator applied in those works was formed

93: by two quartz polished plates mated together. The clearance in it was formed

94: due to roughness and microsphericity of the plates, which size been made as

95: evaluation rather laborious and ambiguous. Experiments showed, that these

96: slitless collimators could transport X-Ray radiation over a distance of 100

97: mm without visible intensity decrease. Because the hypothesis multiple total

98: reflection of an X-Ray beam in the microclearance of a slitless collimator

99: failed to explain the experimental data obtained in \cite{IET2E,IZV1E}

100: , a hypothesis

101: of an X-Ray standing wave (XSW) formation in the microclearance was proposed

102: in \cite{ADV1,POV1E}. The present work is devoted to further development of this

103: hypothesis.

104: 

105: \section{Formation of an X-Ray standing wave upon specular reflection of a plane wave}

106: 

107: Assume that an electromagnetic monochromatic plane travelling wave

108: with the $\sigma $-polarization (i.e. $\vec E_0$ perpendicular to

109: the x-z plane in Fig.~1), wavelength $\lambda_0$ and wave vector

110: $k_0 = \frac{1}{\lambda_0}$ impinges on the boundary separating

111: two materials. If the materials have different refraction indices,

112: part of the wave energy is reflected and the remainder passes to

113: the second material or is refracted. An interference field appears

114: in the first material irrespective of the remainder value. The

115: interference field area depends on the width of an incident plane

116: wave and the incidence angle $\theta $. The intensity of the

117: interference area is directly determinated by the reflection

118: factor on the boundary between materials and peaks at the total

119: reflection of an incident radiation beam. Referring to Fig.~1a,

120: the incident and reflected travelling E-field plane waves can be

121: described as \cite{PRINCIPLES}:

122: 

123: 

124: \begin{equation}

125: \label{eq1}

126: \vec A_0 ( \vec r;t) = \vec E_0

127: e^{i\left[ {\omega t - 2\pi ( \vec k_x x - \vec k_z z )} \right]}

128: \end{equation}

129: 

130: \noindent

131: and

132: 

133: \begin{equation}

134: \label{eq2}

135: \vec A_R ( \vec {r};t) = \vec E_R

136: e^{i\left[ {\omega t - 2\pi ( \vec k_x x + \vec k_z z )} \right]}

137: \end{equation}

138: 

139: For the sake of convenience, let $z=0$ corresponds to the reflector surface.

140: 

141: By locating the intersections of the crests and troughs of the two

142: travelling plane waves in Fig.~1a, one can easily show that the

143: interference between the two coherent waves generates a standing

144: wave with planes of maximum and minimum intensity parallel to the

145: boundary surface. The period of the standing wave is defined by

146: expression \cite{PHYS2}:

147: 

148: \begin{equation}

149: \label{eq3}

150: D = \frac{\lambda}{2 \cdot \sin\theta}

151: \end{equation}

152: 

153: 

154: 

155: In a general case the amplitude relation between the incident and reflected

156: waves is described by the Fresnel equations \cite{PRINCIPLES}:

157: 

158: 

159: \begin{equation}

160: \label{eq4}

161: \left| {\frac{\vec {E}_{R} }{ \vec {E}_{0} }} \right|_{ \bot}  =

162: \frac{{\sin\theta - n \sin\varphi} }{{\sin\theta + n \sin\varphi} }

163: \end{equation}

164: 

165: 

166: \noindent where $\varphi $ is the refraction angle and $n$ is the

167: relative refraction index. The phase change of the electric vector

168: between the incident and reflected waves $\psi $ is defined by

169: expression:

170: 

171: 

172: \begin{equation}

173: \label{eq5}

174: \tan\frac{\psi}{2} = \frac{\sqrt {\cos^{2}\theta - n^2} }{\sin\theta}

175: \end{equation}

176: 

177: 

178: 

179: Equations (\ref{eq3}), (\ref{eq4}) and (\ref{eq5}) describe the reflection phenomenon for any

180: electromagnetic plane wave on a plane interface between two materials. They

181: can also be used to describe, as a first approximation, a total external X-Ray reflection on a vacuum -

182: material interface, which is usually represented as the specular reflection

183: of an X-Ray plane wave, for the sake of simplification%

184: \footnote{

185: This simplified representation disregards the Goos-Hanchen wave front

186: displacement at total wave reflection \cite{PLANAR}, and the radiation penetration to top layers of the material plate.}.

187: The interaction of X-Ray

188: radiation with a material is characterized by the refractive index n equal

189: to unity for vacuum and less than unity for most materials. It can be

190: written as \cite{PHYSIC}:

191: 

192: 

193: \begin{equation}

194: \label{eq6}

195: n = 1 - \delta - i\beta

196: \end{equation}

197: 

198: 

199: 

200: \noindent

201: where $\delta $ is the real part of the refraction index deviation from

202: unity and reflects the material polarization degree upon X-Ray excitation.

203: The imaginary part $\beta $ characteristics the degree of radiation

204: attenuation in the material. Values of $\delta $ and $\beta $ for various

205: media are listed in \cite{TOTAL} and do not exceed $1\cdot 10^{-5}$. The

206: polarization factor magnitude is directly connect with the critical angle of

207: total X-Ray beam reflection $\theta _{c}$ \cite{PHYSIC}:

208: 

209: 

210: \begin{equation}

211: \label{eq7}

212: \delta = \frac{\theta _c^2}{2}

213: \end{equation}

214: 

215: \noindent

216: and can be expressed by the wavelength of incident radiation

217: $\lambda_0$ and common material parameters \cite{PHYSIC}:

218: 

219: 

220: \begin{equation}

221: \label{eq8}

222: \delta = \frac{{e^2{N}Z'\rho \lambda ^2}}{{2\pi mc^{2}A}}

223: \end{equation}

224: 

225: \noindent

226: where $e$ and $m$ are the charge and the mass of an electron, $c$ is the light

227: velocity, $N$ is the Avogadro number, $Z'$ and $A$ are the effective

228: charge and atomic mass for the reflectors material, and $\rho $ is its

229: density. The attenuation factor can be expressed by the linear coefficient

230: of material absorbtion $\mu $ \cite{PHYSIC}:

231: 

232: 

233: \begin{equation}

234: \label{eq9}

235: \beta = \frac{\lambda}{4\pi}\mu

236: \end{equation}

237: 

238: In the conjunction of the secular reflection for an X-Ray radiation the amplitude relation between electric

239: vectors of the incident and reflected waves and the phase expression have

240: the from \cite{PHYS2,PHYSIC,TOTAL}:

241: 

242: 

243: \begin{equation}

244: \label{eq10}

245: \left| {\frac{{\vec {E}_{R}} }{{\vec {E}_{0}} }} \right|_{ \bot}  =

246: \frac{{\theta - \sqrt {\theta ^{2} - 2\delta - 2i\beta} } }{{\theta + \sqrt

247: {\theta ^{2} - 2\delta - 2i\beta} } }

248: \end{equation}

249: 

250: \noindent

251: and

252: 

253: \begin{equation}

254: \label{eq11}

255: \left.

256: \begin{array}{rccl}

257:  \cos\psi & = & 2\left( \frac{\theta}{\theta_c} \right)^2 - 1

258: & \mbox{for}\; \theta \le \theta _{c} \\

259:  \cos\psi & = & 1 &  \mbox{for}\;\theta > \theta _{c} \\

260: \end{array}

261: \right\}

262: \end{equation}

263: 

264: The X-Ray radiation intensity in the vacuum over the boundary surface in the

265: interference field area usually defined as

266: $\left| {\vec A_0 + \vec A_R} \right|^2$

267: can be presented by the next formula \cite{PHYS2}:

268: 

269: 

270: \begin{equation}

271: \label{eq12}

272: I\left( {\theta ,z} \right) = \left| {\vec {E}_{0}}  \right|^{2}\left[ {1 +

273: R + 2\sqrt {R} \cos\left( {\psi - \frac{{2\pi z}}{{D}}} \right)} \right]

274: \end{equation}

275: 

276: 

277: 

278: \noindent

279: where $D$ is the standing wave period along the z-coordinate, expressed by

280: Eqn.(\ref{eq3}) and R is the reflectivity factor which is a complicated function of

281: the incident angle $\theta $ \cite{PHYSIC}:

282: 

283: 

284: \begin{equation}

285: \label{eq13}

286: R = \left| {\frac{{\vec {E}_{R}} }{{\vec {E}_{0}} }} \right|_{ \bot} ^{2} =

287: \frac{{\left( {\theta - a} \right)^{2} + b^{2}}}{{\left( {\theta + a}

288: \right)^{2} + b^{2}}}

289: \end{equation}

290: 

291: 

292: 

293: \noindent

294: where $a$ and $b$ are determined by the expressions:

295: 

296: 

297: \begin{equation}

298: \label{eq14}

299: \left. {

300: \begin{array}{rcl}

301: a^{2} & = &

302: \frac{1}{2}\left[

303: {\sqrt {(\theta^2 - 2\delta)^2 + 4\beta^2} + (\theta^2 - 2\delta)}

304: \right] \\

305:  b^{2} & = &

306: \frac{1}{2}\left[

307: {\sqrt {(\theta^2 - 2\delta)^2 + 4\beta^2} - (\theta^2 - 2\delta)}

308: \right] \\

309: \end{array}

310: } \right\}

311: \end{equation}

312: 

313: 

314: 

315: The interference field can be observed both at $\theta <\theta _{c}$ and

316: $\theta >\theta _{c}$, but in the latter angle range its intensity

317: decreases abruptly \cite{TOTAL}. The standing wave period D achieves its minimum at

318: $\theta =\theta _{c}$ in the $0 \le \theta  \le \theta _{c}$

319: range. As the incident angle decreases, the period D increases to become

320: infinitely large at the grazing incident angle ($\theta =0$). But this is

321: not case in practice, because the coherence of incidence and reflected beams

322: is broken. The most obvious factor causing the interference field erosion is

323: the width finiteness of incident radiation lines $\Delta \lambda$ \cite{PRINCIPLES}.

324: It is generally accepted, that the interference field does not become smeared,

325: if the condition \cite{PHYSIC}:

326: 

327: 

328: \begin{equation}

329: \label{eq15}

330: \Delta \lambda \le \frac{\lambda}{4}

331: \end{equation}

332: 

333: \noindent

334: holds.

335: 

336: Another factor influencing the interference field picture is the roughness

337: of a reflecting surface. Evaluations show that the interference field does

338: not undergo smearing at $\theta =\theta _{c}$ when the height of

339: microheterogeneities on the reflected surface does not exceed the critical

340: size $h_c$ \cite{PHYSIC}:

341: 

342: 

343: \begin{equation}

344: \label{eq16}

345: h_{c} = \frac{{\lambda} }{{8\sqrt {2\delta} } } = \frac{{1}}{{8}}\sqrt

346: {\frac{{\pi mc^{2}A}}{{e^{2}N\rho {Z}'}}}

347: \end{equation}

348: 

349: 

350: 

351: The critical roughness parameter does not depend on the wavelength of the

352: incident radiation. Its magnitude for polished optical quartz plates is

353: equal to 5~nm.

354: 

355: \section{Standing wave formation in the slit of an X-Ray planar waveguide}

356: 

357: A successive reflection of a plane electromagnetic wave in the slit formed

358: by two parallel plates results in the formation of several interference

359: field areas in it (Fig.~1b). Varying the slit size can lead to overlapping

360: the areas to create the uniform interference field zone within the total

361: clearance of the slit (Fig.~1c)\footnote{It is very important to notice that the uniform interference field zone will be appear, in the context of the specular reflection model, for the some specific reflection angles, only. The uniform interference field zone appearance for any reflection angle can be obtained by taking into consideration the expansion of the interference field into top layers of reflectors and the Goos-Hanchen displacement.}. So, it can be expected that an XSW

362: excitation can be formed in the plane slit, when it width falls within a

363: certain range. The minimum slit size for this can be evaluated from

364: expression (\ref{eq3}) for the critical angle of total reflection:

365: 

366: 

367: \begin{equation}

368: \label{eq17}

369: D_{min} = \frac{{\lambda} }{{2\sin\theta _{c}} } \approx \frac{{\lambda

370: }}{{2\theta _{c}} } = \sqrt {\frac{{\pi mc^{2}A}}{{2e^{2}N{Z}'\rho} }}

371: \end{equation}

372: 

373: 

374: 

375: The minimum slit size promoting the XSW formation is independent

376: of an X-Ray incident radiation wavelength. The material structure

377: density $\rho $ of reflectors is a real factor influencing the

378: minimum size $D_{min}$. Its magnitude for quartz reflectors

379: $\left( {\bar Z = 10;\;\bar A = 20} \right)$ is 21~nm. In practice

380: the $D^*_{min}$ value is smaller because an XSW is characterized

381: by a visible intensity up to the X-Ray penetration depth $z_e$

382: into a top layer of a target material, defined by expression

383: \cite{PHYSIC}:

384: 

385: \begin{equation}

386: \label{eq18}

387: \left( {z_{e}}  \right)^{2} = \frac{{\lambda ^{2}}}{{8\pi ^{2}}} \cdot

388: \frac{{1}}{{\sqrt {\left( {\theta _{c}^{2} - \theta}  \right)^{2} + 4\beta

389: ^{2}} + \left( {\theta _{c}^{2} - \theta ^{2}} \right)}}

390: \end{equation}

391: 

392: The average value of the penetration depth parameter for an X-Ray slitless

393: collimator introduced in the work \cite{IZV1E} as

394: $\bar z_e = z_e  \left( \frac{\theta _c}{2} \right)$

395:  is 3.6~nm for MoK$_\alpha $ radiation impinging on a quartz plate.

396: So, the real size of the minimum clearance between the quartz

397: plates $D^{*}_{min}$ is found to be approximately 14~nm. This value is comparable sized wuth the double roughness of reflectors 10~nm.

398: 

399: The upper restriction for the slit in an X-Ray waveguide can be evaluated

400: using ratio Eqn.(\ref{eq15}):

401: 

402: \begin{equation}

403: \label{eq19}

404: D_{max} = \frac{{\lambda} }{{4\left( {\frac{{\Delta \lambda} }{{\lambda} }}

405: \right)}} = \frac{{\lambda ^{2}}}{{4\Delta \lambda} }

406: \end{equation}

407: 

408: For MoK$_\alpha $ radiation, the wavelength is $\lambda =0.707

409: \cdot 10^{-1}$~nm and $\Delta \lambda =0.29 \cdot 10^{-4}$~nm

410: \cite{MIRKIN1E}. Substituting these values into Eqn.(\ref{eq19}) gives

411: $D_{max}=43$\footnote{The important practical parameter

412: influencing on the upper slit size is a degree of the plate

413: parallelity in an X-Ray waveguide.}~nm. In practice, its magnitude

414: is $D^*_{max}=36$~nm. Similar value for CuK$_\alpha $ radiation is

415: equal to $D^*_{max}=91$~nm. Analogous parameters calculated for

416: the set of X-Ray and gamma radiation are collected in Table~1.

417: Quartz total reflection parameters peculiar to the radiation set

418: are represented in the same place. It should be stressed that the

419: X-Ray spectra in incident and emergent beams do not agree between

420: them. For example, if we shall try to form the X-Ray beam excited

421: by X-Ray tube with Mo anode by using of an X-Ray waveguide with a

422: slit size $D>D_{max}$, we shall not find the characteristic deposit

423: in the spectrum of an emergent beam. But if the size will be not excel

424: the value $D_{max}$ ($D_{min}<D<D_{max}$), the characteristic

425: radiation MoK$_\alpha$ will be present in the emergent beam X-Ray

426: spectrum with a great intensity. It can be expected that 

427: the slit width varying in a waveguide would cause the X-Ray spectrum

428: modification in the emergent beam at the transportation of the

429: white X-Ray radiation.

430: 

431: Minimum slit sizes presented in Table~1 (without correction on the

432: X-Ray depth penetration) are the constant. Maximum values of this

433: parameter are near 100~nm for the K$_\alpha$ radiation of Fe group

434: elements. $D_{max}$ and $D_{min}$ magnitudes approach each other

435: for the hard X-Ray radiation (MoK$_\alpha$, AgK$_\alpha$). The

436: greatest values of $D_{max}$ for the gamma radiation have engaged

437: our attention primarily. A significant difference between

438: $D_{max}$ values for X-Ray and nuclear radiations presents a

439: unique possibility for its separation in complicate spectra, even

440: though the radiation wavelengths coinside.

441: 

442: The absolute values of slit widths obtained by calculations have attracted a some attantion. The average value of a slit width accommodating an XSW is

443: only by an order of magnitude higher than the total surface roughness in an

444: X-Ray waveguide. If taking also into account that polished surfaces are

445: characterized by macroheterogeneities, the a high efficiency of a slitless

446: collimator application for TXRF analysis become evident

447: \cite{ELPROM1E,IZV1E,ADV1,POV1E}.

448: 

449: \section{Attenuation of an X-Ray standing wave in a planar slit waveguide}

450: 

451: The excitation of a standing wave in a waveguide slit gives rise

452: to a stationary distribution of the interference field intensity

453: both along the slit channel (along axis $x$) and crosswise (along

454: axis $z$). This distribution is pictured in Fig.~2 to fit the

455: input of a waveguide ($x=0$). The distribution is plotted for a

456: plane X-Ray beam (CuK$_\alpha $) impinging into a slit of the

457: quartz waveguide under an angle $\theta=0.92\cdot\theta_c$ on the

458: reflector surface. The reflection conditions correspond to a value

459: phase variation $\psi \simeq 45^{\circ}$ and a standing wavelength

460: $D \approx 1.1 \cdot D_{min}$.  The arising standing wave is

461: characterized by the penetration depth $z_e=8.6$~nm. Hence, the

462: distribution shown in Fig.~2 obeys the expression $z_e \approx 0.4

463: \cdot D_{min}$.

464: 

465: The standing wave intensity within the slit is described by expression (\ref{eq12}).

466: Outside the slit, the intensity decreases with decrement $\frac{1}{z_{e}}$:

467: 

468: 

469: \begin{equation}

470: \label{eq20}

471: J\left( {z} \right) = I\left( {\theta _{c} ;z} \right)e^{ - {{z}

472: \mathord{\left/ {\vphantom {{z} {z_{e}} }} \right.

473: \kern-\nulldelimiterspace} {z_{e}} }}

474: \end{equation}

475: 

476: 

477: 

478: \noindent where I($\theta _{c};z$) is the undisturbed function of

479: a standing wave intensity defined by expression (\ref{eq12}).

480: Integration of Eqn.(\ref{eq12}) and Eqn.(\ref{eq20}) produces the

481: total intensity for a standing wave in the cross-section of an

482: X-Ray waveguide. The domain of integration for expression

483: (\ref{eq12}) is equal to a slit size. The standing wave total

484: intensity in the reflector top layers can be calculated, to a

485: first approximation, by integrating of function Eqn.(\ref{eq20})

486: in the top layer domain $1.5\cdot D_{min}$ for each reflector.

487: Calculations for the CuK$_\alpha $ radiation in the quartz

488: waveguide show that the total intensity concentrated in the slit

489: is equal to $L(0)\sim 9.2\;E_0^2D_{min}$ and the total intensity

490: connected with top layers of the reflectors is $M(0) \sim 1.2

491: \cdot E_0^2D_{min}$. The standing wave propagation along the slit

492: channel of a waveguide is characterized by retaining the energy

493: relation between a slit and top layers of the reflectors. It means

494: that the relation between the energy in top layers and the total

495: energy of a standing wave holds too:

496: 

497: 

498: \begin{equation}

499: \label{eq21}

500: \alpha \left( x \right) = \frac{{M\left( {x} \right)}}{{L\left( {x}

501: \right) + M\left( x \right)}} = const

502: \end{equation}

503: 

504: Because attenuation of a standing wave occurs only by the absorbtion in

505: reflector top layers, equality (\ref{eq21}) implies continuous energy transfer

506: between different standing wave parts. The attenuation of a standing wave

507: intensity can then be described by the expression:

508: 

509: 

510: \begin{equation}

511: \label{eq22}

512: W\left( {x} \right) = \left[ {L\left( {0} \right) + M\left( {0} \right)}

513: \right]e^{ - \alpha \mu x}

514: \end{equation}

515: 

516: The magnitude of $\alpha $ depends on the wavelength of incident

517: radiation, the reflector material properties, the angle of

518: radiation impinging and the width of a waveguide slit. The

519: dependence of $\alpha $ on the incident angle can be evaluated by

520: calculating its variation with some incident angles area of

521: CuK$_\alpha $ radiation in the quartz waveguide. This gives the

522: values: $\alpha (\theta _c)=0.8; \alpha(\theta_c/2)=0.05$. The

523: value of $\alpha $ decreases abruptly, if the slit width exceeds

524: the wavelength of a standing wave.

525: 

526: 

527: Using formula (\ref{eq22}), the values of $\alpha $ for the

528: incident angle $\theta =0.92\theta_c$ and the condition $s_{slit} \approx 4D$, we one can calculate the total intensity attenuation

529: for a standing wave of CuK$_\alpha $ radiation in the planar

530: quartz extensible waveguide. The total intensity of a standing

531: wave after passing the way $\Delta x=10$~mm in the waveguide is

532: $W(\theta _{c})=0.3\;W_{0}$ and $W(\theta _{c}/2)=0.6\;W_{0}$.  Note that the model of

533: multiple total successive reflection under similar conditions

534: gives: $W_0 \cdot 10^{-27}$ and $0.006\;W_{0}$,

535: respectively.

536: 

537: The calculated data for the total intensity attenuation of an XSW in a

538: waveguide lend an explanation of the high efficiency of X-Ray slitless

539: collimators for X-Ray radiation transport over long distances

540: \cite{IET2E,IZV1E,ADV1,POV1E}.

541: However, the evaluations of clearance sizes between the mated quartz plates

542: in those works strongly disagree ($D \simeq 30$~nm

543: \cite{ADV1}, $D\sim 150$~nm

544: \cite{IET2E}). Moreover, the slit width in the collimators is not a stable

545: parameter and can vary along the collimator length. Therefore, the

546: evaluations of quantity parameters of the emergent beam intensities for a slitless collimator must be treated with caution. In addition, note that the slit width variation can bring about a considerable

547: modification of the X-Ray spectrum of an emergent beam, if the initial X-Ray radiation is a mixed type (white and characteristics).

548: 

549: The above results help to elucidate the advantages and shortcomings of X-Ray

550: slitless collimators. Moreover, they can become the basis for an

551: X-Ray waveguide designing with properties predicted and high intensity of an emergent

552: beam.

553: 

554: \section{Application aspects of a planar X-Ray radiation waveguide}

555: 

556: An X-Ray slitless collimator is an X-Ray planar waveguide with an

557: uncontrolled size of the waveguide slit, which, can be varied during one

558: experiment. Although these variations are not great, an X-Ray slitless

559: collimator should be regarded as a simple and convenient experimental model.

560: For practical purposes, slit waveguides are needed with the greatest possible slit size

561: for a chosen wavelength. Quartz waveguides with slit sizes 36~nm

562: and 91~nm are best suited for MoK$_\alpha $ and CuK$_\alpha $ radiations,

563: respectively. To manufacture such waveguides, the metal thin strips are

564: deposited on to edges of one quartz reflector of a waveguide, and then the

565: waveguide is uniformly compressed between metal plates. The clearance

566: magnitude of a slit can be controlled by the Optical Attenuated Total

567: Reflection method \cite{INTERNAL}.

568: 

569: An X-Ray slitless collimator came into use for X-Ray fluorescence analysis

570: of plane surfaces and thin films (TXRF-SC analysis) some years ago

571: \cite{IZV1E}.

572: The substitution of the slitless collimator by an X-Ray waveguide

573: considerably increases X-Ray radiation density on the surface of a target

574: analyzed and ensures the diagnostic reproduction. Furthermore, an X-Ray

575: waveguide helps avoid the target contact with reflector surfaces. Otherwise,

576: an X-Ray planar waveguide retains all advantages of a slitless collimator in

577: TXRF spectroscopy.

578: But it is notice that the spurious peaks do not disappear of the waveguide application.

579: 

580: Another important field of a planar waveguide application is in X-Ray

581: diffraction research. It can be used for structure investigation of

582: monocrystal surfaces and epitaxial films at the total reflection of an

583: incident X-Ray beam in the parallel and perpendicular geometries \cite{AP1}

584: because a waveguide ensures high X-Ray radiation density in the beam. One

585: more application is for X-Ray energy-dispersive diffractometry of

586: polycrystal thin films because this waveguide is a beautiful former of a

587: narrow high intensity beam of the ``white'' X-Ray radiation. The planar

588: X-Ray waveguide holds greatest promise for using in commercial

589: diffractometers for symmetrical and asymmetrical geometries.

590: 

591: Special choice of materials for the reflectors top layers is liable to

592: provide pseudo-monochromatization of X-Ray radiation in an emergent beam.

593: The waveguide-X-Ray concentrator may be preparated by a surface implantation of reflectors plates with variation of high number ion concentration (Pb, Bi) alone of its length ($n$ -- variation in top layers). 

594: 

595: \section{Planar X-Ray Waveguide -- Monochromator}

596: 

597: Preceding sections are devoted to discussion of the planar X-Ray

598: waveguide using the total X-Ray reflection phenomenon for the

599: standing wave generation in a slit space of the device.

600: But it is well known that the excitation of X-Ray standing wave is possible

601: for the Bragg geometry too \cite{Phys3}. The X-Ray standing wave arises in

602: a slit space between two parallel polished reflectors, if the reflectors

603: are perfect monocrystal been orientated mutually.

604: The mechanism of the standing wave formation in Bragg reflection conditions

605: is not practically differed from one in the case of a total X-Ray reflection

606: (Fig.~1).

607: But a formal consideration of a standing wave formation in Bragg planar

608: X-Ray waveguide (waveguide-monochromator) requests

609: replacement of the X-Ray depth penetration parameter $z_e$ on the parameter

610: of the primary extinction length $z_{ext}$ \cite{SSP1}:

611: 

612: \begin{equation}

613: \label{eq23}

614: z_{ext}

615: =

616: \frac{1}{\sigma}

617: =

618: \frac{\sin\theta_b}{2\lambda|c|}

619: \cdot

620: \frac{m c^2}{e^2}

621: \cdot

622: \frac{v}{|F_h|}

623: \end{equation}

624: 

625: \noindent

626: where $\sigma$ is the extinction factor, $c$ is the polarization factor

627: been equal to unity for a $\sigma$-polarization,

628: $c$ is the light velocity,

629: $m$ and $e$ are the electron characteristics, $v$ is the unit cell volume for the reflector material, $F_h$ is the relative structure factor of the

630: chosen reflection.

631: The $z_{ext}$ magnitude defines the crystal thickness attenuated of the

632: X-Ray beam intensity falling on the crystal under Bragg angle

633: with <<$e$>> factor.

634: It is significantly that the primary extinction length is not depended

635: on a wavelength of an X-Ray radiation.

636: Magnitudes of the primary extinction length are usually two orders higher

637: as values of the depth penetration at the X-Ray total reflection.

638: For example, the magnitude of $z_{ext}$ for (200) NaCl reflection is

639: equal to 660~nm \cite{SSP1}.

640: Because of this, the practical size of a waveguide-monochromator slit may

641: be visibly differed from one calculated and its efficiency must be lower

642: as compared to a waveguide built on the total reflection phenomenon.

643: But the X-Ray radiation density in its emergent beam will be significantly

644: higher as one for the conventional Bonse-Hart monochromator.

645: \textbf {\emph{The planar X-Ray waveguide-monochromator application is conceptually identical with the

646: Borrmann effect manifistation in perfect crystals \cite{PhysZ1, X-Ray2}.}}

647: Authors hope to give a comprehensive analysis of peculiarities which are

648: typical for the planar X-Ray waveguide-monochromator in other work.

649: 

650: \section{Conclusion}

651: 

652: The model of XSW excitation in a planar slit waveguide has been developed by

653: employing the interference wave theory to treat areas whose size

654: considerably exceeds the wavelength of initial radiation but the coherence

655: conditions are still valid. An example of practical embodiment of the idea

656: of such a waveguide is an X-Ray slitless collimator whose unique properties

657: could only be explained in terms of the model of XSW excitation. The

658: evaluation of the upper and lower boundaries for the slit width which

659: provide XSW excitation, points out the way to waveguides building with most

660: efficient for particular purposes.

661: 

662: The presented model is a simple one and disregards some phenomena as such existence of the X-Ray interference field in top layers of waveguide reflectors, 

663: the Goos-Hanchen effect, monotonous modification of the refraction index on

664: a vacuum-material interface \cite{PhSol1} and others. However, even the simplified

665: evaluations made in the work show that a planar X-Ray waveguide and a waveguide-monochromator can became useful tools for the X-Ray diffraction and spectroscopic investigations, especially for the work with synchrotron radiation.

666: 

667: \textbf {\emph{It is very important that the model can be applicated for the neutron and electron beams and will stimulate the waveguides creation both for the white radiation and for the monochromatic one for them.}} The waveguide-monochromator can be basis for the building of a laser pumping system applicated for the hard X-Ray and gamma radiation. The idea of the simplest X-Ray accumulator functioned on base of the waveguide-monochromator will be described in another place.

668: 

669: Direct experiments with planar X-Ray waveguides is carried out today and will be published soon after.

670: 

671: \section{Acknowledgements}

672: 

673: The authors thank d-r A.V.~Okhulkov for useful discussion of the problems and O.S.~Kondratiev for the help in calculations.

674: 

675: \newpage

676: 

677: \renewcommand{\refname}{\centering Reference}

678: 

679: \begin{thebibliography}{10}

680: 

681: \bibitem{X-RAY1}

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684: 

685: \bibitem{PHYS1E}

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687: 

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696: 

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700: \newblock (in Russian).

701: 

702: \bibitem{APL1E}

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705: 

706: \bibitem{FIZTT1E}

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710: 

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720: 

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725: 

726: \bibitem{ADV1}

727: V.~Egorov, O.~Kondratiev, A.~Zuev  and E.~Egorov, {\em Advances in X-Ray

728:   Analysis}, {\bf vol.~}{\bf 43}, p.~406, (2000).

729: 

730: \bibitem{POV1E}

731: V.~Egorov, O.~Kondratiev, A.~Zuev  and E.~Egorov, {\em Poverkhnost}, {\bf

732:   \#~}{\bf 3}, (2001).

733: \newblock (in Russian).

734: 

735: \bibitem{PRINCIPLES}

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738: \newblock New York: Pergamon Press, 6~ed., (1980).

739: 

740: \bibitem{PHYS2}

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743: 

744: \bibitem{PLANAR}

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746: \newblock Oxford: Clarendon Press, (1977).

747: 

748: \bibitem{PHYSIC}

749: M.~Blochin, {\em Physic der R\"{u}ntgenstrahlen}.

750: \newblock Berlin: Verlag der Technic, (1957).

751: 

752: \bibitem{TOTAL}

753: R.~Klockenkamper, {\em Total-Reflection X-Ray Fluorescence Analysis}.

754: \newblock New York: Wiley, (1997).

755: 

756: \bibitem{MIRKIN1E}

757: L.~Mirkin, {\em Handbook of X-Ray analysis of Policrystal materials}.

758: \newblock New York: Consultans Burean, (1964).

759: 

760: \bibitem{INTERNAL}

761: N.~Harrick, {\em Internal Reflection Spectroscopy}.

762: \newblock New York: Wiley, (1967).

763: 

764: \bibitem{AP1}

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767: 

768: \bibitem{Phys3}

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771: 

772: \bibitem{SSP1}

773: R.~James, {\em Solid State Phys.}, {\bf vol.~}{\bf 15}, p.~53, (1963).

774: 

775: \bibitem{PhysZ1}

776: J.~Borrman, {\em Phys. Z}, {\bf vol.~}{\bf 127}, p.~297, (1950).

777: 

778: \bibitem{X-Ray2}

779: L.~Azarov and et. al, {\em X-Ray Diffraction}.

780: \newblock New York: McGRAW-Hill, (1974).

781: 

782: \bibitem{PhSol1}

783: M.~Gasgnier and L.~Nevot, {\em Phys. stat. Sol. (a)}, {\bf vol.~}{\bf 66},

784:   p.~525, (1981).

785: 

786: \end{thebibliography}

787: 

788: \newpage

789: \section{Captions to the Figures}

790: 

791: \hangindent=2cm \noindent Figure~1.~Classical scheme of the

792: standing wave field formation at a specular reflection of a plane

793: monochromatic wave above the mirror surface (a), a scheme of the

794: standing wave field formation at multiple successive reflection of

795: a plane monochromatic wave (b), the principle scheme explaining

796: the formation of the standing wave uniform zone upon trapping

797: monochromatic plane wave radiation by a planar extensive waveguide

798: (c).

799: \bigskip

800: 

801: \hangindent=2cm \noindent

802: Figure~2.~Intensity distribution

803: function for an XSW in a waveguide slit and a top layer of quartz

804: reflectors for an X-Ray beam impinging on the slit under a

805: certain angle of total reflection $\theta$ for the quartz reflectors. The

806: function without absorbtion upon total reflection is shown by a

807: dashed line. The function reflects the picture for

808: $\lambda=0.1541$~nm (CuK$_\alpha$); $\theta=0.92 \cdot \theta_c$;

809: $s=97$~nm.

810: 

811: \end{document}

812: